Large Signal Physical Simulations of Si LD-MOS transistor for RF application

1393 visningar
uppladdat: 2004-01-01
Inactive member

Inactive member

Nedanstående innehåll är skapat av Mimers Brunns besökare. Kommentera arbete
The development of computer aided design tools for devices and circuits has increased the interest for accurate transistor modeling in microwave applications. In the increasingly expanding wireless communication market, there is a huge demand for high performance RF power devices. The silicon LD- MOSFET transistor is dueto its high power performance is today widely used in systems such as mobile base stations, private branch exchanges (PBX), and local area networks (LAN) utilizing the bands between 0.9 to 2.5 GHz. In this research we simulated LD-MOSFET transistor characteristics of the structure provided by Infineon technology at Kista, Stockholm. The maximum drain current obtained in the simulation was 400 mA at a gate voltage of 8 V. This value is somewhat higher than the measured one. This difference can be attributed to the parasitic effects since no parasitic effects were included in the simulations in the beginning. The only parasitic effect studied was by placing the source contact at the bottom of the substrate according to real commercial device. The matching between simulated and measured results were improved and maximum drain current was reduced to 300 mA/mm which was 30% higher than the measured drain current The large signal RF simulations were performed in time-domain in our novel technique developed at LiU. This technique utilizes a very simple amplifier circuit without any passive components. Only DC bias and RF signals are applied to the gate and drain terminals, with the same fundamental frequency but with 180o phase difference. The RF signal at the drain acting as a short at higher harmonics. These signals thus also acted as an active match to the transistor. Large signal RF simulations were performed at 1, 2 and 3 GHz respectively. The maximum of drain current signal was observed at the maximum of drain voltage signal indicating the normal behavior of the transistor. At 1 GHz the output power was 1.25 W/mm with 63% of drain efficiency and 23.7 dB...

...läs fortsättningen genom att logga in dig.

Medlemskap krävs

För att komma åt allt innehåll på Mimers Brunn måste du vara medlem och inloggad.
Kontot skapar du endast via facebook.

Källor för arbetet

Saknas

Kommentera arbetet: Large Signal Physical Simulations of Si LD-MOS transistor for RF application

 
Tack för din kommentar! Ladda om sidan för att se den. ×
Det verkar som att du glömde skriva något ×
Du måste vara inloggad för att kunna kommentera. ×
Något verkar ha gått fel med din kommentar, försök igen! ×

Kommentarer på arbetet

Inga kommentarer än :(

Källhänvisning

Inactive member [2004-01-01]   Large Signal Physical Simulations of Si LD-MOS transistor for RF application
Mimers Brunn [Online]. https://mimersbrunn.se/article?id=27538 [2024-05-06]

Rapportera det här arbetet

Är det något du ogillar med arbetet? Rapportera
Vad är problemet?



Mimers Brunns personal granskar flaggade arbeten kontinuerligt för att upptäcka om något strider mot riktlinjerna för webbplatsen. Arbeten som inte följer riktlinjerna tas bort och upprepade överträdelser kan leda till att användarens konto avslutas.
Din rapportering har mottagits, tack så mycket. ×
Du måste vara inloggad för att kunna rapportera arbeten. ×
Något verkar ha gått fel med din rapportering, försök igen. ×
Det verkar som om du har glömt något att specificera ×
Du har redan rapporterat det här arbetet. Vi gör vårt bästa för att så snabbt som möjligt granska arbetet. ×